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Interface formation of two- and three-dimensionally bonded materials in the case of GeTe-Sb2Te3 superlattices

机译:GeTe-Sb2Te3超晶格情况下二维和三维粘结材料的界面形成

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摘要

GeTe-Sb2Te3 superlattices are nanostructured phase-change materials which are under intense investigation for non-volatile memory applications. They show superior properties compared to their bulk counterparts and significant efforts exist to explain the atomistic nature of their functionality. The present work sheds new light on the interface formation between GeTe and Sb2Te3, contradicting previously proposed models in the literature. For this purpose [GeTe(1 nm)-Sb2Te3(3 nm)] 15 superlattices were grown on passivated Si(111) at 230 degrees C using molecular beam epitaxy and they have been characterized particularly with cross-sectional HAADF scanning transmission electron microscopy. Contrary to the previously proposed models, it is found that the ground state of the film actually consists of van der Waals bonded layers (i.e. a van der Waals heterostructure) of Sb2Te3 and rhombohedral GeSbTe. Moreover, it is shown by annealing the film at 400 degrees C, which reconfigures the superlattice into bulk rhombohedral GeSbTe, that this van der Waals layer is thermodynamically favored. These results are explained in terms of the bonding dimensionality of GeTe and Sb2Te3 and the strong tendency of these materials to intermix. The findings debate the previously proposed switching mechanisms of superlattice phase-change materials and give new insights in their possible memory application.
机译:GeTe-Sb2Te3超晶格是纳米结构相变材料,正在针对非易失性存储应用进行深入研究。与大量同类产品相比,它们显示出优越的性能,并且需要大量的努力来解释其功能的原子性。本工作为GeTe和Sb2Te3之间的界面形成提供了新的思路,这与文献中先前提出的模型相矛盾。为此,[GeTe(1 nm)-Sb2Te3(3 nm)]使用分子束外延在15℃的钝化Si(111)上生长了15个超晶格,并且特别用截面HAADF扫描透射电子显微镜对其进行了表征。与先前提出的模型相反,发现膜的基态实际上由Sb2Te3和菱形GeSbTe的范德华力键合层(即范德华力异质结构)组成。而且,通过在400℃下对膜进行退火显示出,该膜将超晶格重新配置为块状菱形GeSbTe,这在热力学上有利于该范德华层。根据GeTe和Sb2Te3的键合维数以及这些材料相互混合的强烈趋势来解释这些结果。这些发现对先前提出的超晶格相变材料的转换机制进行了辩论,并为它们可能的存储应用提供了新的见解。

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